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News Release from: Berson UV-techniek | Subject: UV system
Edited by the Processingtalk Editorial
Team on 05 March 2004
Removing Ozone and Endotoxins from
process water
Ultraviolet specialist Berson UV-techniek has developed a UV system specifically for removing ozone and endotoxins from process water, to protect reverse osmosis membranes and deionisation resin units
Ultraviolet (UV) specialist Berson UV-techniek has developed a UV system specifically for removing ozone and endotoxins from process water Ozone is widely used for disinfection in many process industries
This article was originally published on Processingtalk on 28 Sep 2004 at 8.00am (UK)
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Because of its properties, however, it is poisonous and can also damage delicate process equipment like reverse osmosis membranes and deionisation resin units.
It therefore needs to be removed once it has performed its disinfection function.
Endotoxins, which are present in the cell walls of Gram-negative bacteria, pose a potential health hazard and must also be removed from process water, especially in high purity applications like pharmaceutical manufacturing and food processing.
A proven and increasingly popular method of ozone and endotoxin removal is UV technology.
Between the wavelengths 200 - 300nm, with a peak at 260nm, ozone absorbs UV and is quickly broken down into harmless compounds.
Endotoxins absorb UV at the shorter wavelengths below 240nm and are also quickly destroyed.
There are two types of UV lamp technology: low-pressure (UV output at 254nm) and medium-pressure (output between 200 - 400nm).
Both of these types are suitable for ozone destruction, with field trials showing that they can reduce ozone from concentrations as high as 90 ppm down to below 0.1 ppm.
Only medium-pressure lamps, however, can be used to destroy endotoxins, due to their output below 240nm.
Berson manufactures both lamp technologies, either in separate or combined systems.
A useful additional benefit of medium pressure UV technology is the inactivation of microorganisms in process water.
Microbial DNA is fatally damaged by UV between 260 - 270nm, which means operators of process plants effectively get three positive outcomes from a single Berson UV system: ozone removal, endotoxin destruction and microbial inactivation.
Based in the Netherlands, Berson UV-techniek is a centre of expertise in UV technology for a wide range of applications, including ozone removal, endotoxin destruction, dechlorination, TOC reduction, advanced oxidation processes and disinfection.
The company has over 25 years experience in the design, development, manufacture and distribution of UV systems worldwide.
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