Product category:
Bearings, lubrication, oil and filters
News Release from: Cuno | Subject: Cuno PhotoShield
Edited by the Processingtalk Editorial
Team on 29 June 2004
Filter provides superior gel and
particle removal
The new Cuno PhotoShield Nylon filter cartridge is a highly retentive membrane filter element designed to provide the highest level of gel and particle removal from photoresist and ancillary chemicals
Nylon 6,6 filter provides superior gel and particle removal for Photoresists and ancillary chemicals The new Cuno PhotoShield Nylon filter cartridge is a highly retentive membrane filter element designed to provide the highest level of gel and particle removal from photoresist and ancillary chemicals while also saving processing time and reducing costs
This article was originally published on Processingtalk on 11 Nov 2004 at 8.00am (UK)
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Excellent flow characteristics with minimal pressure drop are provided by the Cuno patented Advanced Pleat Technology.
Allowing high flow rates while maintaining full efficiency, these filters achieve the required particle specifications in less time, which results in lower filtration costs by reducing energy consumption, pump wear and labour costs.
Developed for photoresist and ancillary chemical applications where high efficiency contaminant removal at 0.04, 0.1 or 0.2 microns is required.
The naturally hydrophilic Nylon 6.6 pleated membrane in all high-density polyethylene (HDPE) provides low extractables and increased filter life.
Removal of gel and hard particles is comparatively better than achieved by other membrane cartridges, reducing process defects.
Since no IPA pre-wetting and system flushing is required, a potential source of contamination and chemical interaction is eliminated while hazardous waste disposal is reduced.
Potential for micro-bubble formation is also reduced by not de-wetting in outgoing fluids, unlike hydrophobic membranes such as polypropylene, UPE and PTFE.
The HDPE and Nylon 6,6 materials of construction offer very low extractables, preventing any change to the photospeed, viscosity or molecular weight of the process chemical, ensuring that ionic, organic and metallic contaminants do not interfere with the process as can happen with other filter materials.
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