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Product category: Liquid Analysis: Spectroscopy, Colour
News Release from: Thermo Fisher Scientific | Subject: Semiconductor solutions
Edited by the Processingtalk Editorial Team on 20 June 2005

Analytical solutions for semiconductor
manufacture

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Thermo Electron Corporation will be exhibiting its complete semiconductor manufacturing solutions offering at Semicon West 2005 exhibition, in San Francisco, July 12-14

Thermo has a full range of Lab-to-Fab products covering the semiconductor industry including material purity testing, process tool temperature control, thin film analysis and metrology, and assembly, test and packaging inspection An established leader within the Laboratory and Life Sciences market, Thermo provides solutions in the semiconductor industry that spans R and D and process development activities, to on-line and at-line metrologies and process control technologies

Available from Thermo are the Neslab recirculating chillers and heat exchangers, providing temperature control for processes including dry and wet etch and deposition, ion implantation, plasma asher and planarisation.

Thermo also offers a wide range of equipment for the test and measurement of semiconductor materials.

For purity control in semiconductor process chemicals, Thermo has developed the Finnigan Element2, a high-resolution ICP-MS tool ensuring lowest possible detection limits for almost the whole periodic table, including Silicon, Phosphor and Sulphur in liquid samples.

The new Finnigan Element GD, on the other hand, is a Glow-Discharge-Mass Spectrometer (GD-MS) for the direct analysis of solid samples down to ppt detection levels in sputtering targets within five minutes.

Furthermore, Thermo offers a range of thin film analysis and metrology products that marry spectroscopy and microscopy.

The Company's premier Noran System 6 brings hyperspectral imaging to traditional SEM/EDS analysis.

The Theta 300 uses Angle Resolved X-ray Photoelectron Spectroscopy (ARXPS) technology to determine the thickness and composition of surface and buried layers.

The Nicolet ECO series of FT-IR metrology tools are used for the measurement of Epitaxial film thickness, determination Boron or Phosphorus concentration in BPSG, Carbon and Oxygen content in silicon and analysis of low-K dielectrics.

Using X-ray collimation technology and traditional X-ray fluorescence spectroscopy, the MicroXR metrology platform is a non-destructive metrology technique that measures the thickness and composition of up to five layers of deposited metals simultaneously.

Thermo Nicolet Almega XR dispersive Raman spectrometer combines high spatial, spectral and axial resolution with exceptional sensitivity and maximum flexibility for defect review and material development.

Finally, the KeyTek ZapMaster Mk2 is an ESD and Latch-up simulator used during semiconductor design and failure analysis processes to enhance ESD immunity in semiconductor designs and ensure the inherent reliability of today's complex semiconductor circuitry.

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